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Project #1

Project #1

To identify new cleaning process for alumina based ceramic components used in semiconductor industry

No

Yes

No

09/15/2008

Sriram Seshagiri

Ceramics

Part of manufacturing equipment

18" diamter ring

Medium

1-5 lbs

Smooth

Hard

Simple

Yes

Carbon Deposits
Oxides

Yes

Manufacturing of semiconductors

Same

Doesn't result in needed cleanliness levels

Remove deposits and oxides from equipment prior to being reused.

No relation

Stored

No relation

Cleaning performed by outside company.

Two possible cleaning methods were identified. The first was using laser ablation and the second utilized an alkaline based cleaner and ultrasonics. The ultrasonic cleaning took longer to clean the parts but worked better than the laser ablation. Follow up testing may include baking parts at elevated temperatures before cleaning with the ultrasonics.

No

Yes

No

No

Yes

Name Class Section
Document Trial #0 Trial 3
Document Trial #1 Trial 3
Document Trial #2 Trial 3
Document Trial #3 Trial 3
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